Picture of ALD - Beneq TFS 200
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Bengt Meuller
Process:
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Description

Main application: Deposition thin high-k oxide layers

Materials: HfO, Al2O3

8" max wafer diameter

3 precursors currently installed:

  • Hafnium (TDMAHf, Booster).
  • Water.
  • Aluminum (TMA)
Details
Tool name:
ALD - Beneq TFS 200
Area/room:
Q256: Aixtron 200 / XRD
Category:
CVD equipment
Manufacturer:
Benq
Model:
TFS 200
Instructors & Licensed Users

Instructors

Licensed Users

Tool Modes
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