Picture of ALD system - Picosun Sunale R-100
Current status:
WARNING
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Responsibles
1st Responsible:
Bengt Meuller
Process:
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Description

The tool is located in the Aerosol room (Q246) in the Berzelius lab. The tool has 4 precursor positions, currently with: 1. Zirconium (TEMAZr, Pico Booster). 2. Hafnium (TDMAHf, Pico Booster). 3. Water. 4.  Aluminum (TMA). The tool is intended for deposition of thin layers of high-k oxides, where oxide/interface purity and quality is a concern. Wafer/sample loading/unloading is done in nitrogen ambient in a glovebox.

Maximum wafer/sample size: 4-inch (100 mm).

Details
Tool name:
ALD system - Picosun Sunale R-100
Area/room:
Q246: Cluster tool
Category:
CVD equipment
Manufacturer:
Picosun
Model:
Sunale R-100
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Tool Modes
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