Machine installed in room Q161 (UVL lab).

Talbot Displacement Lithography is dedicated for large area (up to 4" wafers) exposure of regular pattern (gratings, square or hexagonal dot array) with resolution below 100nm and estimated maximum pitch approx 1.5µm. Exposure insensitive to uneven surface. Light source monochromatic pulsed excimer laser (193nm wavelength) - class 4.