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| 3D Printer Zortrax M200 | 48 | Special equipment | Martin Magnusson | |
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| 4p probe Lucas Labs Pro4-4400 | 225 | Metrology | Anders Kvennefors | |
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| Aerosol system | 22 | Epitaxy | Håkan Lapovski | |
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View
| ALD - Beneq TFS 200 | 610 | CVD equipment | Seyedeh Fatemeh Mousavi | André Andersen |
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View
| ALD - Fiji | 704 | CVD equipment | Seyedeh Fatemeh Mousavi | Anders Kvennefors |
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View
| ALD system - Picosun Sunale R-100 | 608 | CVD equipment | Seyedeh Fatemeh Mousavi | André Andersen |
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View
| ALD system - Savannah-100 | 606 | CVD equipment | Seyedeh Fatemeh Mousavi | Anders Kvennefors |
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| Argon milling (Temescal) | 211 | Special equipment | Johan Stjernholm | Anders Kvennefors |
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View
| Asher - New PlasmaPreen | 205 | Plasma processing | Amirreza Ghassami | |
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View
| Bonding machine - K&S 4523 | 12 | Packaging/wire bonding | Alex den Ouden | Sarah McKibbin |
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View
| Bruker AFM Icon | 300 | Metrology | Peter Blomqvist | David Alcer |
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View
| Bruker Dektak XT Stylus Profilometer | 304 | Metrology | Peter Blomqvist | |
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View
| BSL2 lab LAF bench | 142 | Special equipment | Jason Beech | |
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View
| Chemical Mechanical Polisher | 51 | Dicing/scribing/polishing | Max Bäckström | |
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View
| Critical Point Dryer - K850 | 209 | Special equipment | Max Bäckström | Anders Kvennefors |
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View
| Dicer - Disco DAD 3320 | 45 | Dicing/scribing/polishing | Max Bäckström | Anders Kvennefors |
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View
| Dishwashing machine | 208 | Special equipment | Emil N G Eriksson | Håkan Lapovski |
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View
| EBL - Raith 150 | 101 | E-beam lithography | Anders Kvennefors | Alex den Ouden |
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| EBL - Voyager | 44 | E-beam lithography | Anders Kvennefors | Alex den Ouden |
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| EBL - Voyager (Night) | 54 | E-beam lithography | Anders Kvennefors | Alex den Ouden |
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View
| EDS - Hitachi SU8700 | 715 | Metrology | David Alcer | Amirreza Ghassami |
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View
| Electrical measurement setup | 27 | Metrology | Claes Thelander | |
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| Ellipsometer - alphaSE | 399 | Metrology | Sarah McKibbin | Peter Blomqvist |
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View
| Ellipsometer RC2 | 400 | Metrology | Peter Blomqvist | David Alcer |
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View
| Etcher APEX SLR Cl-based ICP-RIE – Plasma-Therm | 700 | Plasma processing | Amirreza Ghassami | Max Bäckström |
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View
| Etcher APEX SLR F-based ICP-RIE – Plasma-Therm | 112 | Plasma processing | Amirreza Ghassami | Max Bäckström |
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View
| Etcher RIE - Trion T2 | 224 | Plasma processing | Amirreza Ghassami | Sarah McKibbin |
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View
| Evaporator - AVAC | 201 | Evaporation | Johan Stjernholm | |
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View
| Evaporator - Temescal E-Beam | 210 | Evaporation | Johan Stjernholm | David Alcer |
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View
| FIB - FEI NanoLab 600 | 103 | Focused ion beam | Peter Blomqvist | Simon de Fouw |
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View
| Flash Lamp Annealer | 215 | Thermal processing | Emil N G Eriksson | |
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View
| Fume hood Acid - YR | 41 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Fume hood acid - ALD | 33 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Fume hood acid - Cluster tool | 34 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Fume hood acid - new EBL | 47 | Wet process benches | Natalia Volkova | Ivan Maximov |
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View
| Fume hood Gold Plating - YR | 40 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Fume hood solvent - ALD | 32 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Fume hood spinner solvent - YR | 39 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| G2V Pico variable solar simulator | 1003 | Metrology | David Alcer | Magnus Borgström |
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View
| Hall effect measurement setup | 15 | Metrology | Alex den Ouden | Alex den Ouden |
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View
| Inca | 21 | Computing | Håkan Lapovski | |
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View
| LayTec - 3 Lambda | 50 | Metrology | Sungyoun Ju | Sebastian Lehmann |
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View
| LayTec - Spectrum | 49 | Metrology | Sungyoun Ju | |
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View
| Mask aligner - Karl Süss MJB 4 DUV | 305 | Photolithography | Sarah McKibbin | Anders Kvennefors |
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View
| Mask aligner MJB4 (soft UV) | 316 | Photolithography | Sarah McKibbin | Anders Kvennefors |
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View
| Mask-less Aligner - MLA150 | 317 | Photolithography | Jason Beech | Sarah McKibbin |
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View
| Microscope - Axio Imager A1m Zeiss | 104 | Metrology | Håkan Lapovski | |
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View
| Microscope - Axio Imager M1m Zeiss | 207 | Metrology | Håkan Lapovski | |
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View
| Microscope - Axioplan Zeiss | 17 | Metrology | Håkan Lapovski | |
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View
| Microscope - Axioskop Zeiss | 10 | Metrology | Håkan Lapovski | |
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View
| Microscope - Nikon Optiphot | 11 | Metrology | Håkan Lapovski | |
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View
| Microscope - Olympus BX53M System Microscope | 106 | Metrology | Amirreza Ghassami | Sarah McKibbin |
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View
| Moorfield Nanoetch Tool | 114 | Plasma processing | Sarah McKibbin | Alex den Ouden |
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View
| MOVPE - Aixtron 200/4 | 601 | Epitaxy | Magnus Borgström | Sungyoun Ju |
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View
| MOVPE - Aixtron CCS (Cluster) | 707 | Epitaxy | Sebastian Lehmann | Sungyoun Ju |
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View
| MOVPE - Aixtron CCS 788676 | 721 | Epitaxy | Sebastian Lehmann | Johan Stjernholm |
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View
| MOVPE - Epiquip | 5 | Epitaxy | Magnus Borgström | Sungyoun Ju |
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View
| New Bonder - F&S | 88 | Packaging/wire bonding | Max Bäckström | Sarah McKibbin |
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View
| NIL 6 inch system - Obducat | 306 | Nanoimprint lithography | Sarah McKibbin | Anders Kvennefors |
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View
| Off-line EBL | 20 | Computing | Anders Kvennefors | |
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View
| Oven - EBL | 109 | Thermal processing | Håkan Lapovski | |
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| Oven - EVA | 212 | Thermal processing | Håkan Lapovski | Emil N G Eriksson |
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| Oven - UVL1 | 311 | Thermal processing | Håkan Lapovski | |
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| Oven - UVL2 | 312 | Thermal processing | Håkan Lapovski | Emil N G Eriksson |
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View
| Ozone cleaner - UVOH 150 | 221 | Special equipment | Amirreza Ghassami | Anders Kvennefors |
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View
| PECVD - MicroSys 200 | 706 | CVD equipment | Luke Hankin | |
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View
| PECVD - SPTS DELTA LPX APM | 716 | CVD equipment | Amirreza Ghassami | |
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View
| PLD - TSST | 720 | Epitaxy | Jonas Johansson | Anders Kvennefors |
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View
| PL-mapper - Enlitech | 500 | Metrology | David Alcer | Peter Blomqvist |
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View
| Probe station - Cascade 11000B | 1001 | Metrology | Anders Kvennefors | David Alcer |
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View
| PVE300 – Bentham | 1002 | Metrology | David Alcer | Magnus Borgström |
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View
| RTP system - RTP 1200-100 | 204 | Thermal processing | Emil N G Eriksson | Emil N G Eriksson |
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View
| Safety Cabinet Mars GS 900 | 609 | Special equipment | Håkan Lapovski | Emil N G Eriksson |
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View
| Scriber - Karl Süss | 13 | Dicing/scribing/polishing | Alex den Ouden | |
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View
| Scriber, manual | 14 | Dicing/scribing/polishing | Alex den Ouden | |
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View
| SEM - FEI NanoLab 600 | 102 | Metrology | Peter Blomqvist | Simon de Fouw |
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View
| SEM - GeminiSEM 500 | 711 | Metrology | Peter Blomqvist | Anders Kvennefors |
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View
| SEM - Hitachi SU8010 | 705 | Metrology | Peter Blomqvist | Anders Kvennefors |
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View
| SEM - Hitachi SU8700 | 714 | Metrology | David Alcer | Amirreza Ghassami |
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View
| SEM - LEO 1560 | 607 | Metrology | Anders Kvennefors | Peter Blomqvist |
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View
| Sputter - Q150T ES | 709 | Sputtering | Emil N G Eriksson | Max Bäckström |
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View
| Sputterer - AJA Orion 5 | 206 | Sputtering | Johan Stjernholm | Emil N G Eriksson |
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View
| Tabletop SEM Hitachi | 1101 | Metrology | David Alcer | Maria Messing |
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View
| Talbot Displacement Lithography | 8 | Photolithography | Sarah McKibbin | Anders Kvennefors |
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View
| Tensiometer - Theta Lite | 708 | Metrology | Anders Kvennefors | |
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View
| Tepla Microwave Plasma System | 115 | Plasma processing | Sarah McKibbin | Alex den Ouden |
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View
| Vacuum oven 1 | 57 | Thermal processing | Alex den Ouden | Anders Kvennefors |
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View
| Wet bench acid - EBL | 110 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench acid - EVA | 213 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench acid - UVL | 313 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench solvent - Aerotaxy | 37 | Wet process benches | Natalia Volkova | |
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View
| Wet bench solvent - EBL | 111 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench solvent - EVA | 214 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench solvent - new EBL | 46 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench solvent - UVL1 | 314 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| Wet bench solvent - UVL2 | 315 | Wet process benches | Natalia Volkova | Emil N G Eriksson |
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View
| XRD - Bruker D8 Discover | 605 | Metrology | Peter Blomqvist | Alex den Ouden |