The tool has successfully passed the acceptance tests and is now ready for processing. It provides high-quality deposition of SiO2 and SiNx, with excellent thickness uniformity across wafers up to 200 mm (8 inch) and stable process performance.
Users can tune key film properties, including refractive index, stress, and stoichiometry. Ammonia-free nitride recipes are also available, which can help reduce film stress, improve optical properties, and fine-tune film stoichiometry.
Important: Do not use any paste, grease, oil, or other adhesive materials to secure samples to the wafer carriers. These materials can outgas during processing and contaminate the chamber.
The wafer size shoule be 8". Please use the recessed wafer carriers, which are available for different wafer sizes if your sample is 2", 4" or 6".
After completing your deposition, record the following information in the logbook located next to the tool:
- Recipe name
- Substrate material(s)
- Process time
- Deposition type (SiO2 or SiNx)
- Any relevant process parameters or observations
- Your name and date of use
Accurate logbook records are essential for process traceability, troubleshooting, and chamber maintenance.
We also have access to a large library of qualified SPTS recipes, supporting a wide range of process requirements.