Picture of EBL - Raith 150
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Anders Kvennefors
Process:
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Description

Electron beam lithography system Raith 150. Equipped with thermal field emission cathode, laser interferometer stage. Maximum sample size is 6 inch. Installed 2003. Room Q156, NANO-process lab.

Details
Tool name:
EBL - Raith 150
Area/room:
Q156: EBL room
Category:
E-beam lithography
Manufacturer:
Raith GmbH
Model:
Raith 150
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