Picture of NIL 6 inch system - Obducat
Current status:
AVAILABLE
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Responsibles
1st Responsible:
Sarah McKibbin
Process:
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Description

Nanoimprint lithography system from Obducat, samples up to 6". Combined thermal and/or UV-imprint. Max temperature 200°C, max pressure 60bar. Location: room Q237, YR-room, Berzeilius lab.

Details
Tool name:
NIL 6 inch system - Obducat
Area/room:
Q237: YR lab
Category:
Nanoimprint lithography
Manufacturer:
Obducat
Model:
[Not specified]
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Tool Modes
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